Chemicus

Wilhelm Ostwald

1853 - 1932

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Zijn biografie is beschikbaar in 82 verschillende talen op Wikipedia (toegenomen van 81 in 2024). Wilhelm Ostwald staat op plaats 28 onder de meest populaire chemicus (gedaald van plaats 14 in 2024), plaats 2 onder de meest populaire biografieën uit Letland en op de eerste plaats onder de populairste chemicus uit Letland.

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Among Chemicuses

Among chemicuses, Wilhelm Ostwald ranks 28 out of 602Before him are Eduard Buchner, John Macleod, George Washington Carver, Fritz Haber, John Fenn, and Friedrich Wöhler. After him are Carl Wilhelm Scheele, Hans Adolf Krebs, Otto Wallach, Alexander R. Todd, Otto Hahn, and Robert Robinson.

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Contemporaries

Among people born in 1853, Wilhelm Ostwald ranks 4Before him are Vincent van Gogh, Cecil Rhodes, and Hendrik Lorentz. After him are Heike Kamerlingh Onnes, Albrecht Kossel, Hussein bin Ali, Sharif of Mecca, Chulalongkorn, Carl Larsson, José Martí, Aleksei Brusilov, and Vladimir Solovyov. Among people deceased in 1932, Wilhelm Ostwald ranks 2Before him is Archduchess Gisela of Austria. After him are Margaret Brown, Sophia of Prussia, Eduard Bernstein, Aristide Briand, Ronald Ross, Giuseppe Peano, Manuel II of Portugal, King C. Gillette, Paul Doumer, and Augusta, Lady Gregory.

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In Letland

Among people born in Letland, Wilhelm Ostwald ranks 2 out of NaNBefore him are Sergei Eisenstein (1898). After him are Mikhail Tal (1936), Mark Rothko (1903), Isaiah Berlin (1909), Mariss Jansons (1943), Mikhail Baryshnikov (1948), Vaira Vīķe-Freiberga (1937), Kārlis Ulmanis (1877), Nicolai Hartmann (1882), Ernst Gideon von Laudon (1717), and Aron Nimzowitsch (1886).

Among Chemicuses In Letland

Among chemicuses born in Letland, Wilhelm Ostwald ranks 1After him are Paul Walden (1863), Lina Stern (1878), and Oswald Schmiedeberg (1838).

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