化学家

Wilhelm Ostwald

1853 - 1932

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他的传记在维基百科上提供 82 种语言版本(较 2024 年的 81 种增加)。Wilhelm Ostwald在最受欢迎的化学家中排名第28位(较 2024 年的第14位下降),在拉脱维亚人物传记中排名第2位,并在最受欢迎的拉脱维亚化学家中排名第1位。

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Among 化学家

Among 化学家, Wilhelm Ostwald ranks 28 out of 602Before him are Eduard Buchner, John Macleod, George Washington Carver, Fritz Haber, John Fenn, and Friedrich Wöhler. After him are Carl Wilhelm Scheele, Hans Adolf Krebs, Otto Wallach, Alexander R. Todd, Otto Hahn, and Robert Robinson.

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Contemporaries

Among people born in 1853, Wilhelm Ostwald ranks 4Before him are Vincent van Gogh, Cecil Rhodes, and Hendrik Lorentz. After him are Heike Kamerlingh Onnes, Albrecht Kossel, Hussein bin Ali, Sharif of Mecca, Chulalongkorn, Carl Larsson, José Martí, Aleksei Brusilov, and Vladimir Solovyov. Among people deceased in 1932, Wilhelm Ostwald ranks 2Before him is Archduchess Gisela of Austria. After him are Margaret Brown, Sophia of Prussia, Eduard Bernstein, Aristide Briand, Ronald Ross, Giuseppe Peano, Manuel II of Portugal, King C. Gillette, Paul Doumer, and Augusta, Lady Gregory.

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In 拉脱维亚

Among people born in 拉脱维亚, Wilhelm Ostwald ranks 2 out of NaNBefore him are Sergei Eisenstein (1898). After him are Mikhail Tal (1936), Mark Rothko (1903), Isaiah Berlin (1909), Mariss Jansons (1943), Mikhail Baryshnikov (1948), Vaira Vīķe-Freiberga (1937), Kārlis Ulmanis (1877), Nicolai Hartmann (1882), Ernst Gideon von Laudon (1717), and Aron Nimzowitsch (1886).

Among 化学家 In 拉脱维亚

Among 化学家 born in 拉脱维亚, Wilhelm Ostwald ranks 1After him are Paul Walden (1863), Lina Stern (1878), and Oswald Schmiedeberg (1838).

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