化学家

Michael Behe

1952 - 至今

Photo of Michael Behe

Icon of person Michael Behe

他的传记在维基百科上提供 24 种语言版本(较 2024 年的 23 种增加)。Michael Behe在最受欢迎的化学家中排名第526位(较 2024 年的第510位下降),在美国人物传记中排名第7824位(较 2019 年的第7457位下降),并在最受欢迎的美国化学家中排名第92位。

Memorability Metrics

Loading...

Page views of Michael Behe by language

Loading...

Among 化学家

Among 化学家, Michael Behe ranks 526 out of 602Before him are Omowunmi Sadik, Nina Andreyeva, Bruce Ames, James Smithson, Charles Blagden, and Arthur Rudolf Hantzsch. After him are Darleane C. Hoffman, Eugen Baumann, Oswald Schmiedeberg, Robert Jarvik, Marc Delafontaine, and Margaret Oakley Dayhoff.

Most Popular 化学家 in Wikipedia

Go to all Rankings

Contemporaries

Among people born in 1952, Michael Behe ranks 413Before him are André Comte-Sponville, Mario Runco Jr., Linda Thomas-Greenfield, Allen Collins, Ulrich Wehling, and Joe Earl. After him are Linda Martin, Sushma Swaraj, David R. Ellis, Randy Jones, Tomas Ledin, and Hanna Gronkiewicz-Waltz.

Others Born in 1952

Go to all Rankings

In 美国

Among people born in 美国, Michael Behe ranks 7,826 out of NaNBefore him are Tony Gilroy (1956), Robert Chartoff (1933), Kim Dickens (1965), Alberta Hunter (1895), Benjamin Smith Barton (1766), and Tim Howard (1979). After him are Joyce Van Patten (1934), Annie Wersching (1977), Thelma Todd (1906), Ann Druyan (1949), Brent W. Jett Jr. (1958), and Keri Russell (1976).

Among 化学家 In 美国

Among 化学家 born in 美国, Michael Behe ranks 92Before him are Donella Meadows (1941), David Baker (1962), Allen J. Bard (1933), Karen Wetterhahn (1948), Helen Murray Free (1923), and Bruce Ames (1928). After him are Darleane C. Hoffman (1926), Robert Jarvik (1946), Margaret Oakley Dayhoff (1925), Mary L. Good (1931), Bruce Alberts (1938), and Emma P. Carr (1880).

العربية中文NederlandsEnglishFrançaisDeutschMagyarItaliano日本語PolskiPortuguêsРусскийEspañol