CHEMIST

Benjamin Silliman

1779 - 1864

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Benjamin Silliman (August 8, 1779 – November 24, 1864) was an American chemist and science educator. He was one of the first American professors of science, at Yale College, the first person to use the process of fractional distillation in America. Read more on Wikipedia

Since 2007, the English Wikipedia page of Benjamin Silliman has received more than 115,561 page views. His biography is available in 15 different languages on Wikipedia. Benjamin Silliman is the 582nd most popular chemist, the 11,496th most popular biography from United States and the 114th most popular American Chemist.

Memorability Metrics

  • 120k

    Page Views (PV)

  • 41.75

    Historical Popularity Index (HPI)

  • 15

    Languages Editions (L)

  • 2.94

    Effective Languages (L*)

  • 2.82

    Coefficient of Variation (CV)

Among CHEMISTS

Among chemists, Benjamin Silliman ranks 582 out of 602. Before him are Gilbert Stork, Omowunmi Sadik, F. Albert Cotton, Jacqueline Barton, Bonnie Bassler, and Percy Lavon Julian. After him are Peter Jacob Hjelm, Yellapragada Subbarow, Martyn Poliakoff, John George Children, Richard Lerner, and Esther M. Conwell.

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Contemporaries

Among people born in 1779, Benjamin Silliman ranks 39. Before him are Stephen Decatur, Joel Roberts Poinsett, Peter Mark Roget, Hugh Gough, 1st Viscount Gough, Mountstuart Elphinstone, and Zebulon Pike. After him are Joseph Story, and Samuel D. Ingham. Among people deceased in 1864, Benjamin Silliman ranks 72. Before him are Jacques Jasmin, John Clare, William T. Anderson, Juris Alunāns, John Sedgwick, and Leonidas Polk. After him are William Smith O'Brien, and Henry Schoolcraft.

Others Born in 1779

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Others Deceased in 1864

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In United States

Among people born in United States, Benjamin Silliman ranks 11,496 out of 20,380. Before him are James Corson (1906), Stanford R. Ovshinsky (1922), Jerry Vale (1930), Jimmy Iovine (1953), Fabiano Caruana (1992), and John Henninger Reagan (1818). After him are Jason Williams (1975), Jonathan Richman (1951), Lil Pump (2000), Constance Money (1956), Emily Rudd (1993), and Ellen Roosevelt (1868).

Others born in United States

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Among CHEMISTS In United States

Among chemists born in United States, Benjamin Silliman ranks 114. Before him are Richard Zare (1939), Susan Solomon (1956), F. Albert Cotton (1930), Jacqueline Barton (1952), Bonnie Bassler (1962), and Percy Lavon Julian (1899). After him are Richard Lerner (1938), Esther M. Conwell (1922), Ruth R. Benerito (1916), Donald Howard Menzel (1901), Margaret Oakley Dayhoff (1925), and George Church (1954).

American born Chemists

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