Alan J. Heeger

1936 - Today

Photo of Alan J. Heeger

Icon of person Alan J. Heeger

Alan Jay Heeger (born January 22, 1936) is an American physicist, academic and Nobel Prize laureate in chemistry. Heegar was elected as a member into the National Academy of Engineering in 2002 for co-founding the field of conducting polymers and for pioneering work in making these novel materials available for technological applications. Read more on Wikipedia

Since 2007, the English Wikipedia page of Alan J. Heeger has received more than 105,330 page views. His biography is available in 47 different languages on Wikipedia (up from 44 in 2019). Alan J. Heeger is the 183rd most popular chemist (down from 157th in 2019), the 1,328th most popular biography from United States (down from 972nd in 2019) and the 31st most popular American Chemist.

Alan J. Heeger is most famous for his discovery of the world's first semiconductor, the polycrystalline silicon.

Memorability Metrics

  • 110k

    Page Views (PV)

  • 69.22

    Historical Popularity Index (HPI)

  • 47

    Languages Editions (L)

  • 11.79

    Effective Languages (L*)

  • 2.94

    Coefficient of Variation (CV)

Page views of Alan J. Heegers by language


Among chemists, Alan J. Heeger ranks 183 out of 510Before him are Peter D. Mitchell, Gerhard Herzberg, Stephanie Kwolek, Giulio Natta, Tapputi, and Emil Erlenmeyer. After him are Robert Bruce Merrifield, John Fenn, Nicolas Leblanc, Julius Axelrod, Richard F. Heck, and Raymond Davis Jr..

Most Popular Chemists in Wikipedia

Go to all Rankings


Among people born in 1936, Alan J. Heeger ranks 66Before him are Duncan Edwards, Valerie Solanas, Dražan Jerković, Christine Nöstlinger, Alan Alda, and Joaquín Peiró. After him are Raymond Poulidor, Denny Hulme, Paul L. Smith, Sylvia Browne, Jair Marinho, and Alfonso, Duke of Anjou and Cádiz.

Others Born in 1936

Go to all Rankings

In United States

Among people born in United States, Alan J. Heeger ranks 1,328 out of 15,968Before him are Tom Berenger (1949), William Boeing (1881), Duff McKagan (1964), Edmund Kemper (1948), Martin Balsam (1919), and Matt LeBlanc (1967). After him are Henry Gantt (1861), Andrew S. Tanenbaum (1944), Robert Bruce Merrifield (1921), John Fenn (1917), Robert Loggia (1930), and Paul Stanley (1952).

Among CHEMISTS In United States

Among chemists born in United States, Alan J. Heeger ranks 31Before him are William Howard Stein (1911), Robert F. Furchgott (1916), Paul Lauterbur (1929), Jerome Karle (1918), Stanford Moore (1913), and Stephanie Kwolek (1923). After him are Robert Bruce Merrifield (1921), John Fenn (1917), Julius Axelrod (1912), Richard F. Heck (1931), Raymond Davis Jr. (1914), and F. Sherwood Rowland (1927).